Photomask or wafer compacts:<br> <br><br><br>- consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties,<br> <br><br><br>- having non porous, abrasion resistant or impact resistant surface properties,<br> <br><br><br>- fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and<br> <br><br><br>- with or without a gasket seal,<br>of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Tariff preference
condition:Y,certificate:Y864,action:27|condition:Y,action:07